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TSMC will receive its first ASML’s most advanced High NA EUV (High Numerical Aperture Extreme Ultraviolet) lithography ...

Taiwan's TSMC is likely to be the second chip-making company after Intel to receive the <a target=_blank href= ...

Additional process variation creates challenges at the boundary between two mask exposures.

Samsung Electronics is reportedly preparing to introduce its first High-NA EUV (extreme ultraviolet lithography) equipment in ...

According to a recent TechInsights report, fabs equipped with EUV tools could see electricity consumption exceed 54,000 ...

The rollout of extreme ultraviolet (EUV) lithography could be hit by the increasing power requirements of the technology.

Leading-edge semiconductor fabs to consume 54,000 Gigawatts a year by 2030, which is more than some countries consume today.

ASML’s projected 2025 revenue is $31.5 billion, factoring in reduced China demand. Read why recent pullback in ASML stock ...

Oregon and Intel were passed over for an $825M chip research center award, but officials say the state remains a strong ...

The US government has designated the Albany NanoTech Complex in New York as the site for the first flagship research and ...

Chipmaker TSMC is expected to receive the first shipment of High Numerical Aperture NA Extreme Ultraviolet (High NA EUV) ...