When silicon nitride and silicon oxide were tested separately, the etch rate increased for the nitride and the oxide layer ...

"Cryo etch with the hydrogen fluoride plasma showed a significant increase ... Adding it during the process quadrupled the etch rate for silicon dioxide, but it only had marginal impact on the ...

Green14 used a plasma spray process that requires an output of 85 kW in a lab-scale setup with the aim of simulating bulk silicon production from quartz in the presence of hydrogen plasma as a ...

Green14, a Sweden-based startup company has built a pilot reactor to refine silicon and silane based on its novel hydrogen plasma technology at Sweden’s KTH Royal Institute of Technology.

Anisotropic wet etching is a common method for fabricating nanowires from various materials, such as silicon, germanium, or III-V semiconductors. By using etchants with high selectivity for specific ...